Professor

Department of Electronic Engineering, School of Internet of Things Engineering

Joined Department: 2013

Email: Larring0078@hotmail.com or xiaosq@jiangnan.edu.cn

Education background                                                                     

Bachelor of Applied Physics, Shanghai Jiao Tong University, Shanghai, China, 2003;

Second Bachelor of Applied Electronic Technology, Shanghai Jiao Tong University, Shanghai, China, 2003;

Ph.D. in Optics, Shanghai Jiao Tong University, Shanghai, China, 2008

Areas of Research Interests                                                          

1. Two-dimensional layered semiconductor materials and devices

2. Low-temperature plasma sources and application

3. Si solar cells

Social Services                                                                    

1. Member of CIGIU International Standardization Technical Committee (2017-2019)

2. Member of Low-dimensional Nanostructure and Performance Group of China Nanotechnology Standardization Technical Committee (2017)

Research Projects                                                              

Fundamental Research Funds for the Central Universities of China: Optical and electrical study on two-dimensional layered semiconductor materials and their heterojunctions (2017-2019)

National Natural Science Foundation of China: Preparation and investigation of n-type crystalline silicon HIT solar cells based on a soft plasma deposition technique (2015-2017)

National Science Foundation of Jiangsu Province: Design and investigation of Au-nanoparticles surface plasmon in n-type crystalline silicon HIT solar cells (2014-2017)

Joint innovation project of Jiangsu Province: Development and key technology research of high-efficiency silicon solar cells via green plasma atomized deposition technique (2014-2016)

Research status                                                              

My research focuses on the research and development of novel semiconductor materials and devices as well as low temperature plasma technologies. I have made some innovative achievements on low temperature plasma technologies (including plasma generation, diagnostic and applications), surface passivation and property modulation of Si-based solar cells, as well as CVD synthesis and optical and electrical property modulation of two-dimensional (2D) semiconducting materials. I have published 48 SCI papers (including 22 papers of first author and corresponding author) with an H-index of 14 and a total citation of 440. I have also published two chapters in Springer as well as Taylor and Francis publishers.

Since 2013 August when I joined Jiangnan University, I have established Plasma Semiconductor Materials and Devices Lab and led a team. We have successfully set up capacitively coupled electrodeless plasma (CCEP) system, plasma atomized deposition (PAD) system as well confined-space CVD system. These systems are used for surface passivation and property modulation of Si-based solar cells, as well as CVD synthesis and optical and electrical property modulation of two-dimensional (2D) semiconducting materials. Related papers are published in Materials Science and Engineering R-Reports（IF: 29.280），ACS Applied Materials & Interface（IF: 7.504）, Critical Reviews in Solid State and Materials Science (IF: 6.455)，Catalysis Today（IF: 4.636），Scientific Reports（IF: 4.259）, , Particle and Particle Systems Characterization（IF: 4.474），Applied Surface Science（IF: 3.387）and Journal of Physics D: Applied Physics.

Honors and awards                                                                

1. Honor Young Scholar of Jiangnan University-A Class (2017)

2. Best Presentation Award of China PV Technology International Conference (CPTIC 2017)

3. Honor Young Scholar of Jiangnan University-B Class (2016)

4. Honor Young Scholar of Jiangnan University-B Class (2015)

5. Best Presentation Award of 9^th China SoG Silicon and PV Power Conference (2013)

Representative SCI papers (first author and/or corresponding author)                                                          

1. Lufang Zhang, Shaopeng Feng, Shaoqing Xiao*, Gang Shen, Xiumei Zhang, Haiyan Nan, Xiaofeng Gu and Kostya Ostrikov, Layer-controllable graphene by plasma thinning and post-annealing, Applied Surface Science 2018, 441, 639-646.（3.387）

2. Di Cai, Shaoqing Xiao*, Haiyan Nan, Xiaofeng Gu and Kostya (Ken) Ostrikov, Robust fabrication of quantum dots on few-layer MoS₂ by soft hydrogen plasma and post annealing, Particle and Particle Systems Characterization 2018, accepted. （IF: 4.474）

3. Jingjing Liu, Yao Yao, Shaoqing Xiao* and Xiaofeng Gu, Review of status developments of high-efficiency crystalline silicon solar cells, Journal of Physics D: Applied Physics 2018, 51 (12), 123001.（IF: 2.588）

4. Yao Yao, Xiaoyu Xu, Xiumei Zhang, Haiping Zhou, Xiaofeng Gu and Shaoqing Xiao* Enhanced efficiency in HIT solar cells by gradient doping, Materials Science in Semiconductor Processing 2018, 77, 16-23.（IF: 2.359）

5. Xiumei Zhang, Haiyan Nan, Shaoqing Xiao*, Xi Wan, Zhenhua Ni, Xiaofeng Gu* and Kostya Ostrikov, Shape-uniform, High-quality Monolayer MoS₂ Crystals for Gate-tuneable Photoluminescence, ACS Applied Materials & Interfaces 2017, 9 (48), 42121-42130.（IF: 7.504）

6. Yao Yao, Shaoqing Xiao*, Xiumei Zhang, Xiaofeng Gu, Simulation optimizing of n-type HIT solar cells with AFORS-HET, Modern Physics Letters B 2017, 31 (19-21), 1740025.

7. Yunfei Sha, Shaoqing Xiao*, Xiumei Zhang, Fang Qin and Xiaofeng Gu*, Layer-by-layer thinning of MoSe2 by soft and reactive plasma etching, Applied Surface Science 2017, 411, 182-188.（IF: 3.387）

8. Shaoqing Xiao*，Peng Xiao, Xuecheng Zhang, Dawei Yan, Xiaofeng Gu, Fang Qin, Zhenhua Ni*, Zhao Jun Han and Kostya (Ken) Ostrikov*, Atomic-layer soft plasma etching of MoS₂, Scientific Reports 2016, 6, 19945.（IF: 4.259）

9. S. Q. Xiao*, S. Xu* and K. Ostrikov*, Low-temperature Plasma Processing for Si Photovoltaics, Materials Science and Engineering R-Reports 2014, 78, 1-29.（IF: 29.280）

10. S. Q. Xiao*, S. Xu*, X. F. Gu, D. Y. Song, H. P. Zhou and K. Ostrikov, Chemically active plasmas for surface passivation of Si Photovoltaics, Catalysis Today 2015, 252, 201-210.（IF: 4.636）

11. Shaoqing Xiao*, Jingjing Zhou, Shiyong Huang, Peng Xiao, Xiaofeng Gu, Dawei Yan and Shuyan Xu*, Highly textured conductive and transparent ZnO films for HIT solar cell applications, Journal of Physics D: Applied Physics 2015, 48 (30), 305105. （IF: 2.588）

12. H. P. Zhou, S. Xu*, M. Xu, S. Q. Xiao* and Y. Xiang, Nanocrystalline silicon embedded in silicon suboxide synthesized in high-density inductively coupled plasma, Journal of Physics D: Applied Physics 2015, 48 (44), 445302.（IF: 2.588）

13. Shaoqing Xiao* and Shuyan Xu*, High-efficiency Silicon Solar Cells-Materials and Device Physics, Critical Reviews in Solid State and Materials Sciences 2014, 39 (4), 277-317. （IF: 6.455）

14. S. Q. Xiao*, S. Xu*, H. P. Zhou, D. Y. Wei, S. Y. Huang, L. X. Xu, C. C. Sern, Y. N. Guo, S. Khan and Y. Xu, Silicon homojunction solar cells via a hydrogen plasma etching process, Journal of Physics D: Applied Physics 2013, 46 (10), 105103.（IF: 2.588）

15. S. Q. Xiao*, S. Xu*, H. P. Zhou, D. Y. Wei, S. Y. Huang, L. X. Xu, C. C. Sern, Y. N. Guo and S. Khan, Amorphous/crystalline silicon heterojunction solar cells via remote inductively coupled plasma processing, Applied Physics Letters 2012, 100 (23), 233902. （IF: 3.411）

16. S. Q. Xiao and S. Xu*, Plasma-aided fabrication in Si-based photovoltaic applications: an overview，Journal of Physics D: Applied Physics 2011, 44 (17), 174033.（IF: 2.588）

17. S. Q. Xiao, S. Xu*, D. Y. Wei, S. Y. Huang, H. P. Zhou and Y. Xu, From amorphous to microcrystalline: Phase transition in rapid synthesis of hydrogenated silicon thin film in low frequency inductively coupled plasmas, Journal of Applied Physics 2010, 108 (11), 113520.（IF: 2.068）